Knight Campus Cleanroom Core Facility
The Knight Campus Cleanroom is a research fabrication facility for micro and nano-scale processing currently focused on neuro-implant compatible material. The facility is open to university researchers and industry PIs seeking to fabricate novel materials for applications in bioengineering, advanced semiconductors, battery technology, or high-speed electronics.
We can easily accommodate a wide range of substrates up to 150mm and are continuing to expand capabilities in various areas, for example: utilizing a dual frequency PECVD enabling low stress deposition of Silicon based films of SiO2, SiN and SiC or with our 6- Magnetron sputter chamber equipped with RF, DC or HIPIMS power supplies and unique reactive gases.
The Cleanroom operates as a shared core facility with dedicated, highly trained staff offering:
User onboarding and hands-on training
Access is available to University of Oregon and Knight Campus researchers, with opportunities for external collaborations. For access, training requirements, pricing, or experimental support, please contact the Cleanroom team or visit the Knight Campus Core Facilities website and the Nemo instructions page.
Please contact Sean Harris, the cleanroom engineer at 541-346-4534 or cleanroom@uoregon.edu, for more information on rates and relevant documents. For access, training requirements, pricing, or experimental support, please contact the Cleanroom team or visit the Knight Campus Core Facilities website, and the Nemo instructions page.